Robust and Radiation-Resistant Hofmann-Type Metal−Organic Frameworks for Record Xenon/Krypton Separation
DOI: 10.1021/jacs.1c12873Jan. 1, 2022
Adsorbents
Data points
# | Adsorbent | Gas | q / mol kg⁻¹ | S / mol mol⁻¹ | -ΔH / kJ mol⁻¹ |
---|---|---|---|---|---|
4369 | ZJU-74a-Pd | Argon/Nitrogen | 0.3 | 1.5 | 4.0 |
4382 | ZJU-74a-Pd | Argon/Oxygen | 0.3 | 1.5 | 4.0 |
4397 | ZJU-74a-Pd | Krypton/Argon | 0.8 | 2.67 | 28.0 |
4427 | ZJU-74a-Pd | Krypton/Nitrogen | 0.8 | 4.0 | 28.0 |
4452 | ZJU-74a-Pd | Krypton/Oxygen | 0.8 | 4.0 | 28.0 |
4485 | ZJU-74a-Pd | Xenon/Argon | 2.2 | 287.0 | 45.0 |
4548 | ZJU-74a-Ni | Xenon/Krypton | 2.7 | 75.0 | 50.0 |
4549 | ZJU-74a-Pd | Xenon/Krypton | 2.2 | 103.0 | 45.0 |
4608 | ZJU-74a-Pd | Xenon/Nitrogen | 2.2 | 701.0 | 45.0 |
4635 | ZJU-74a-Pd | Xenon/Oxygen | 2.2 | 213.0 | 45.0 |